Patent search ap:("ASML Netherlands B.V.") AND inv:"BIJLSMA Page Jan Wouter"

1.

发明公开
SURROUNDING PATTERN AND PROCESS AWARE METROLOGY 审中-公开

公开(公告)号：EP4445221A1

公开(公告)日：2024-10-16

申请号：EP22818449.5

申请日：2022-11-22

Applicant: ASML Netherlands B.V.

Inventor： ZHANG, Huaichen , MAAS, Ruven Cornelis , PARAYIL VENUGOPALAN, Syam , BIJLSMA, Jan Wouter

IPC: G03F7/20

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