公开(公告)号：US20240347311A1

公开(公告)日：2024-10-17

申请号：US18580152

申请日：2022-06-23

Applicant: ASML Netherlands B.V.

Inventor： Bruno LA FONTAINE ,  Juying DOU ,  Zhidong DU ,  Che-Chia KUO

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/06375

Abstract: Apparatuses and systems for stabilizing electron sources in charged particle beam inspection systems are provided. In some embodiments, a system may include an electron source comprising an emitting tip electrically connected to two electrodes and configured to emit an electron; and a base coupled to the emitting tip, wherein the base is configured to stabilize the emitting tip via the coupling.