公开(公告)号：US20200088659A1

公开(公告)日：2020-03-19

申请号：US16574970

申请日：2019-09-18

Applicant: ASML Netherlands B.V.

Inventor： Long MA ,  Chih-Yu JEN ,  Zhonghua DONG ,  Peilei ZHANG ,  Wei FANG ,  Chuan LI

IPC: G01N23/2251 ,  H01J37/28

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast-charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast-charging defects.

公开(公告)号：US20230386021A1

公开(公告)日：2023-11-30

申请号：US18365130

申请日：2023-08-03

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Zhaohui GUO ,  Ruoyu ZHU ,  Chuan LI

IPC: G06T7/00 ,  G06F18/24

CPC classification number: G06T7/001 ,  G06F18/24 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: A pattern grouping method may include receiving an image of a first pattern, generating a first fixed-dimensional feature vector using trained model parameters applying to the received image, and assigning the first fixed-dimensional feature vector a first bucket ID. The method may further include creating a new bucket ID for the first fixed-dimensional feature vector in response to determining that the first pattern does not belong to one of a plurality of buckets corresponding to defect patterns, or mapping the first fixed-dimensional feature vector to the first bucket ID in response to determining that the first pattern belongs to one of a plurality of buckets corresponding to defect patterns.

公开(公告)号：US20200020092A1

公开(公告)日：2020-01-16

申请号：US16508167

申请日：2019-07-10

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Zhaohui GUO ,  Ruoyu ZHU ,  Chuan LI

IPC: G06T7/00 ,  G06K9/62

Abstract: A pattern grouping method may include receiving an image of a first pattern, generating a first fixed-dimensional feature vector using trained model parameters applying to the received image, and assigning the first fixed-dimensional feature vector a first bucket ID. The method may further include creating a new bucket ID for the first fixed-dimensional feature vector in response to determining that the first pattern does not belong to one of a plurality of buckets corresponding to defect patterns, or mapping the first fixed-dimensional feature vector to the first bucket ID in response to determining that the first pattern belongs to one of a plurality of buckets corresponding to defect patterns.