公开(公告)号：US20240377765A1

公开(公告)日：2024-11-14

申请号：US18286486

申请日：2022-03-31

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Stephen EDWARD ,  Sjoerd Nicolaas Lambertus DONDERS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  David Q'DWYER ,  Andrey NIKIPELOV ,  Gosse Charies DE VRIES

IPC: G03F7/00 ,  G02F1/35

Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.