公开(公告)号：US20240410827A1

公开(公告)日：2024-12-12

申请号：US18704156

申请日：2022-10-10

Applicant: ASML Netherlands B.V.

Inventor： Diederik Jan MAAS ,  Wilhelmus Patrick Elisabeth Maria OP 'T ROOT ,  Marinus JOCHEMSEN ,  Hugo Augustinus Joseph CRAMER

IPC: G01N21/47 ,  G03F7/00

Abstract: Disclosed is metrology apparatus for measurement of a diffractive structure on a substrate. comprising: a radiation source operable to provide first radiation for excitation of the diffractive structure, said first radiation having a first wavelength; a detection arrangement operable to detect at least diffracted second radiation comprising a second harmonic of said first radiation, said diffracted second radiation being generated from said diffractive structure and/or substrate and diffracted by said diffractive structure; and a processing arrangement operable to determine a parameter of interest relating to said diffractive structure from at least said diffracted second radiation.