公开(公告)号：US20190196341A1

公开(公告)日：2019-06-27

申请号：US16328750

申请日：2017-08-18

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Kevin J VIOLETTE ,  Igor Matheus Petronella AARTS ,  Haico Victor KOK ,  Eric Brian CATEY

IPC: G03F7/20 ,  G03F9/00

Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.

公开(公告)号：US20250147438A1

公开(公告)日：2025-05-08

申请号：US18835287

申请日：2023-01-04

Applicant: ASML Netherlands B.V.

Inventor： Krishanu SHOME ,  Emily Rose FINAN ,  Kirill Urievich SOBOLEV ,  Joshua ADAMS ,  Jonathan S. RODNEY ,  Yuxiang LIN ,  Eric Brian CATEY

IPC: G03F7/00 ,  G02B5/00 ,  G02B26/00

Abstract: A system includes an imaging system, a spatial filter, and a detector. The system is configured to receive a plurality of diffraction orders. The spatial filter is configured to block one or more undesired diffraction orders of the plurality of diffraction orders and to pass one or more desired diffraction orders of the plurality of diffraction orders. The spatial filter includes one or more obscurations having an angular dependent radius that varies azimuthally. The detector is configured to receive and measure an intensity of the one or more desired diffraction orders. The spatial filter is motorized.

公开(公告)号：US20240263941A1

公开(公告)日：2024-08-08

申请号：US18562675

申请日：2022-05-24

Applicant: ASML Netherlands B.V.

Inventor： Rui CHENG ,  Joshua ADAMS ,  Franciscus Godefridus Casper BIJNEN ,  Eric Brian CATEY ,  Igor Matheus Petronella AARTS

IPC: G01B11/27 ,  G03F9/00

CPC classification number: G01B11/272 ,  G03F9/7046 ,  G03F9/7065 ,  G03F9/7069 ,  G03F9/7076 ,  G03F9/7092

Abstract: Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the corrected data to accurately expose patterns on the substrate. An example method can include receiving a measurement signal including a combined intensity signal corresponding to first and second diffracted light beams diffracted from first and second alignment targets having different orientations. The example method can further include fitting the combined intensity signal using templates to determine weight values and determining, based on the templates and weight values, first and second intensity sub-signals corresponding to the first and second diffracted light beams. The method can further include determining first and second intensity imbalance signals based on the first and second intensity sub-signals and determining a set of corrections to the measurement signal based on the first and second intensity imbalance signals.