公开(公告)号：US20230305407A1

公开(公告)日：2023-09-28

申请号：US18018065

申请日：2021-07-06

Applicant: ASML Netherlands B.V.

Inventor： Fei LIU ,  Jin LIAN ,  Zhuangxiong HUANG ,  Laurentius Cornelius DE WINTER ,  Frank STAALS

IPC: G03F7/20 ,  G01N21/47 ,  G03F7/00

CPC classification number: G03F7/70641 ,  G01N21/4738 ,  G01N21/4788 ,  G03F7/706851

Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.