公开(公告)号：US20200333714A1

公开(公告)日：2020-10-22

申请号：US16755127

申请日：2018-10-05

Applicant: ASML Netherlands B.V.

Inventor： Fei WANG ,  Wei FANG ,  Kuo-Shih LIU

IPC: G03F7/20 ,  H01J37/22 ,  G01B15/00 ,  H01J37/28 ,  H01L21/66

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.