公开(公告)号：US20170184979A1

公开(公告)日：2017-06-29

申请号：US15325428

申请日：2015-06-29

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen HSU ,  Feng-Liang LIU

IPC: G03F7/20 ,  G03F1/70 ,  G06F17/50 ,  G03F1/36

CPC classification number: G03F7/70433 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70441 ,  G03F7/70483 ,  G03F7/7085 ,  G06F17/5081

Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing one or more assist features onto, or adjusting a position and/or shape of one or more existing assist features in, the portion. Adjusting the illumination source and/or the one or more assist features may be by an optimization algorithm.

公开(公告)号：US20190285991A1

公开(公告)日：2019-09-19

申请号：US16428373

申请日：2019-05-31

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen HSU ,  Feng-Liang LIU

IPC: G03F7/20 ,  G06F17/50 ,  G03F1/70 ,  G03F1/36

Abstract: Disclosed herein are several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift , tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing assist features onto or adjusting positions and/or shapes existing assist features in the portion. Adjusting the illumination source and/or the assist features may be by an optimization algorithm.