公开(公告)号：EP3391140A1

公开(公告)日：2018-10-24

申请号：EP16805144.9

申请日：2016-12-02

Applicant: ASML Netherlands B.V.

Inventor： BROUNS, Derk Servatius Gertruda ,  JANSSEN, Paul ,  KAMALI, Mohammad Reza ,  PÉTER, Mária ,  VAN DER ZANDE, Willem Joan ,  VAN ZWOL, Pieter-Jan ,  VLES, David Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F1/64 ,  G03F1/66

CPC classification number: G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983

Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

公开(公告)号：EP3611570A1

公开(公告)日：2020-02-19

申请号：EP18189305.8

申请日：2018-08-16

Applicant: ASML Netherlands B.V.

Inventor： KAMALI, Mohammad Reza ,  PETERSON, Brennan

IPC: G03F7/20 ,  G05B19/418

Abstract: Disclosed is a method for controlling a manufacturing process for manufacturing semiconductor devices. The method comprises obtaining performance data indicative of the performance of the manufacturing process, the performance data comprising values for a performance parameter across a substrate subject to the manufacturing process. A process correction for the manufacturing process is determined based on the performance data and of at least one control characteristic related to one or more control parameters of the manufacturing process. The determining step is further based on an expected stability of the manufacturing process when applying the process correction.

公开(公告)号：EP3221747A2

公开(公告)日：2017-09-27

申请号：EP15794591.6

申请日：2015-11-16

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： KRUIZINGA, Matthias ,  JANSEN, Maarten Mathijs Marinus ,  AZEREDO LIMA, Jorge Manuel ,  BOGAART, Erik Willem ,  BROUNS, Derk Servatius Gertruda ,  BRUIJN, Marc ,  BRULS, Richard Joseph ,  DEKKERS, Jeroen ,  JANSSEN, Paul ,  KAMALI, Mohammad Reza ,  KRAMER, Ronald Harm Gunther ,  LANSBERGEN, Robert Gabriël Maria ,  LEENDERS, Martinus Hendrikus Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik Roelof ,  LYONS, Joseph H. ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme François Sylvain Virgile ,  VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/00

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。