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公开(公告)号：US10698312B2
公开(公告)日：2020-06-30
申请号：US16247179
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Pieter-Jan Van Zwol , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Florian Didier Albin Dhalluin , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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Patent Agency Ranking
公开(公告)号：US10228615B2
公开(公告)日：2019-03-12
申请号：US15320749
申请日：2015-07-02
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Arjen Boogaard , Florian Didier Albin Dhalluin , Alexey Sergeevich Kuznetsov , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Andrei Mikhailovich Yakunin
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
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公开(公告)号：US10139725B2
公开(公告)日：2018-11-27
申请号：US14775249
申请日：2014-03-04
Applicant: ASML Netherlands B.V.
Inventor： James Norman Wiley , Juan Diego Arias Espinoza , Derk Servatius Gertruda Brouns , Laurentius Cornelius De Winter , Florian Didier Albin Dhalluin , Pedro Julian Rizo Diago , Luigi Scaccabarozzi
Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
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公开(公告)号：US20150192861A1
公开(公告)日：2015-07-09
申请号：US14419425
申请日：2013-07-30
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Arthur Winfried Eduardus Minnaert , Johannus Elisabeth Hubertus Muitjens , Andrei Mikhailovich Yakunin , Luigi Scaccabarozzi , Hans Joerg Mallmann , Kurstat Bal , Carlo Cornelis Maria Luijten , Han-Kwang Nienhuys , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling , Pedro Julian Rizo Diago , Maarten Van Kampen , Nicolaas Aldegonda Jan Maria Van Aerle
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/10
Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
Abstract translation: 公开了一种设置有光谱纯度滤光器的光刻设备，其可以设置在以下一个或多个位置：（a）在照明系统中，（b）与图案形成装置相邻，辐射束中的静态位置或 固定用于与图案形成装置一起运动，（c）在投影系统中，和（d）邻近衬底台。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜。 膜可以设置有保护性盖层和/或薄金属透明层。
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公开(公告)号：US10678140B2
公开(公告)日：2020-06-09
申请号：US15753811
申请日：2016-08-02
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Han-Kwang Nienhuys , Luigi Scaccabarozzi
Abstract: Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.
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公开(公告)号：US09606445B2
公开(公告)日：2017-03-28
申请号：US14419425
申请日：2013-07-30
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Arthur Winfried Eduardus Minnaert , Marcel Johannus Elisabeth Hubertus Muitjens , Andrei Mikhailovich Yakunin , Luigi Scaccabarozzi , Hans Joerg Mallmann , Kurstat Bal , Carlo Cornelis Maria Luijten , Han-Kwang Nienhuys , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling , Pedro Julian Rizo Diago , Maarten Van Kampen , Nicolaas Aldegonda Jan Maria Van Aerle
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/10
Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
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