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公开(公告)号：US20190025717A1
公开(公告)日：2019-01-24
申请号：US15526639
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Frits VAN DER MEULEN , Maaeten JANSEN , Jorge AZEREDO LIMA , Derk BROUNS , Marc BRUIJN
IPC: G03F7/20
Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
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