公开(公告)号：US20220082945A1

公开(公告)日：2022-03-17

申请号：US17418719

申请日：2019-11-29

Applicant: ASML Netherlands B.V.

Inventor： Andrey NIKIPELOV ,  Antonius Franciscus Johannes DE GROOT ,  Mariya NEKLYUDOVA

IPC: G03F7/20

Abstract: A method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a main body having a main body surface, wherein the method includes the steps of: coating at least part of the main body with a layer of a first coating material; and treating a plurality of discrete regions of the first coating material with laser irradiation to selectively convert said first coating material in said regions to a second coating material having a different structure or density.