公开(公告)号：US20180299796A1

公开(公告)日：2018-10-18

申请号：US15570934

申请日：2016-03-29

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Maarten HOLTRUST ,  Martinus VAN DUIJNHOVEN ,  Francis FAHRNI ,  Frank Johannes Jacobus VAN BOXTEL ,  Anne Willemijn Bertine QUIST ,  Bart Dinand PAARHUIS ,  Daan Daniel Johannes VAN SOMMEREN

IPC: G03F7/20

Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

公开(公告)号：US20170090296A1

公开(公告)日：2017-03-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Mark Constant Johannes BAGGEN ,  Gerard Johannes BOOGAARD ,  Nicolaas Rudolf KEMPER ,  Sander KERSSEMAKERS ,  Robertus Mathijs Gerardus RIJS ,  Frank Johannes Jacobus VAN BOXTEL ,  Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Jessica Henrica Anna VERDONSCHOT ,  Hendrikus Herman Marie COX

IPC: G03F7/20 ,  G10K11/168

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.

公开(公告)号：US20210080834A1

公开(公告)日：2021-03-18

申请号：US17050264

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

公开(公告)号：US20210240090A1

公开(公告)日：2021-08-05

申请号：US17049719

申请日：2019-04-04

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US20180101099A1

公开(公告)日：2018-04-12

申请号：US15567103

申请日：2016-03-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Cornelius Adrianus Lambertus DE HOON ,  Frank Johannes Jacobus VAN BOXTEL

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/709

Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.

公开(公告)号：US20160334718A1

公开(公告)日：2016-11-17

申请号：US15109427

申请日：2014-12-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  INgmar August KERP ,  Pieter Johannes Gertrudis MEIJERS ,  Jeroen Pieter STARREVELD ,  Derk TEN HOOPEN ,  Martinus VAN DUIJNHOVEN ,  Edward HAGE ,  Evert Hendrik Jan DRAAIJER ,  Wesley OOMS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

Abstract translation: 支撑装置，被配置为相对于第二部分支撑第一部分，最小化两个部分之间的振动传递，包括构造成在压力下使用气体以在第一和第二部分之间提供支撑力的支撑系统; 连接到支撑系统并被配置为容纳处于压力下的气体并将气体提供给支撑系统的气体室; 以及一部分声阻尼材料，其布置在所述气体室内的位置处，以分离所述气体室内的第一气体容纳区域和第二气体容纳区域，其中所述声学阻尼材料部分具有第一侧面和第二侧面 其中所述第一气体容纳区域在所述第一侧上且所述第二气体容纳区域位于所述第二侧。