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公开(公告)号：US11243470B2
公开(公告)日：2022-02-08
申请号：US16331547
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitish Kumar , Adrianus Johannes Hendrikus Schellekens , Sietse Thijmen Van Der Post , Ferry Zijp , Willem Maria Julia Marcel Coene , Peter Danny Van Voorst , Duygu Akbulut , Sarathi Roy
IPC: G03F7/20
Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.
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公开(公告)号：US11092902B2
公开(公告)日：2021-08-17
申请号：US16624609
申请日：2018-05-17
Applicant: ASML Netherlands B.V.
Inventor： Johannes Franciscus Martinus D'Achard Van Enschut , Tamara Druzhinina , Nitish Kumar , Sarathi Roy , Yang-Shan Huang , Arie Jeffrey Den Boef , Han-Kwang Nienhuys , Pieter-Jan Van Zwol , Sander Bas Roobol
Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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公开(公告)号：US20170357155A1
公开(公告)日：2017-12-14
申请号：US15614551
申请日：2017-06-05
Applicant: ASML Netherlands B.V.
Inventor： Richard QUINTANILHA , Nitish Kumar
IPC: G03F7/00 , G03F7/20 , G03F9/00 , G01N21/956
CPC classification number: G03F7/0002 , G01N21/956 , G03F7/0005 , G03F7/2004 , G03F7/2008 , G03F7/70625 , G03F7/70633 , G03F9/7019
Abstract: A metrology apparatus uses radiation (304) in an EUV waveband. A first detection system (333) includes a spectroscopic grating (312) and a detector (313) for capturing a spectrum of the EUV radiation after interaction with a target (T). Properties of the target are measured by analyzing the spectrum. The radiation (304) further includes radiation in other wavebands such as VUV, DUV, UV, visible and IR. A second detection system (352, 372, 382) is arranged to receive at least a portion of radiation (350) reflected by the first spectroscopic grating and to capture a spectrum (SA) in one or more of said other wavebands. The second waveband spectrum can be used to enhance accuracy of the measurement based on the EUV spectrum, and/or it can be used for a different measurement. Other types of detection, such as polarization can be used instead or in addition to spectroscopic gratings.
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Patent Agency Ranking
公开(公告)号：US20200209608A1
公开(公告)日：2020-07-02
申请号：US16731249
申请日：2019-12-31
Applicant: ASML Netherlands B.V.
Inventor： Arjan Johannes Anton Beukman , Alessandro Polo , Henricus Petrus Maria Pellemans , Nitish Kumar
IPC: G02B26/00
Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
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公开(公告)号：US10254644B2
公开(公告)日：2019-04-09
申请号：US15614551
申请日：2017-06-05
Applicant: ASML Netherlands B.V.
Inventor： Richard Quintanilha , Nitish Kumar
IPC: G03B27/54 , G03F7/00 , G03F7/20 , G01N21/956 , G03F9/00
Abstract: A metrology apparatus uses radiation (304) in an EUV waveband. A first detection system (333) includes a spectroscopic grating (312) and a detector (313) for capturing a spectrum of the EUV radiation after interaction with a target (T). Properties of the target are measured by analyzing the spectrum. The radiation (304) further includes radiation in other wavebands such as VUV, DUV, UV, visible and IR. A second detection system (352, 372, 382) is arranged to receive at least a portion of radiation (350) reflected by the first spectroscopic grating and to capture a spectrum (SA) in one or more of said other wavebands. The second waveband spectrum can be used to enhance accuracy of the measurement based on the EUV spectrum, and/or it can be used for a different measurement. Other types of detection, such as polarization can be used instead or in addition to spectroscopic gratings.
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公开(公告)号：US11692948B2
公开(公告)日：2023-07-04
申请号：US16963905
申请日：2019-01-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitish Kumar , Richard Quintanilha , Markus Gerardus Martinus Maria Van Kraaij , Konstantin Tsigutkin , Willem Marie Julia Marcel Coene
IPC: G01N21/956 , G02F1/35 , G03F1/84
CPC classification number: G01N21/956 , G02F1/353 , G03F1/84 , G01N2021/95676 , G01N2201/06113
Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.
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公开(公告)号：US11428925B2
公开(公告)日：2022-08-30
申请号：US16731249
申请日：2019-12-31
Applicant: ASML Netherlands B.V.
Inventor： Arjan Johannes Anton Beukman , Alessandro Polo , Henricus Petrus Maria Pellemans , Nitish Kumar
Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
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公开(公告)号：US10690995B2
公开(公告)日：2020-06-23
申请号：US16307376
申请日：2017-06-01
Applicant: ASML Netherlands B.V.
Inventor： Nitish Kumar , Simon Reinald Huisman
Abstract: A supercontinuum radiation source for an alignment mark measurement system comprises: a radiation source; illumination optics; a plurality of waveguides; and collection optics. The radiation source is operable to produce a pulsed radiation beam. The illumination optics is arranged to receive the pulsed pump radiation beam and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of the pulsed radiation beam. Each of the plurality of waveguides is arranged to receive at least one of the plurality of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as to generate a supercontinuum sub-beam. The collection optics is arranged to receive the supercontinuum sub-beam from each of the plurality of waveguides and to combine them so as to form a supercontinuum radiation beam.
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