公开(公告)号：US20190339615A1

公开(公告)日：2019-11-07

申请号：US16512558

申请日：2019-07-16

Applicant: ASML Netherlands B.V.

Inventor： Sander Frederik WUISTER ,  Oktay YiLDiRiM ,  Gijsbert RISPENS ,  Alexey Olegovich POLYAKOV

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/039 ,  G03F7/00

Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovsikte material.