公开(公告)号：US20180364582A1

公开(公告)日：2018-12-20

申请号：US15994400

申请日：2018-05-31

Applicant: ASML Netherlands B.V.

Inventor： Daan Maurits SLOTBOOM ,  Peter Jacob Kramer ,  Martinus Henrikus Antonius Leenders ,  Bart Dinand Paarhuis

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70141 ,  G03F9/7046 ,  G03F9/7096

Abstract: An apparatus and method for performing a measurement operation on a substrate in accordance with one or more substrate alignment models. The one or more substrate alignment models are selected from a plurality of candidate substrate alignment models. The apparatus, which may be a lithographic apparatus, includes an external interface which enables selection of the substrate alignment model(s) and/or alteration of the substrate alignment model(s) prior to the measurement operation.