公开(公告)号：EP3492985A1

公开(公告)日：2019-06-05

申请号：EP17205158.3

申请日：2017-12-04

Applicant: ASML Netherlands B.V.

Inventor： VENSELAAR, Joannes Jitse ,  TSIATMAS, Anagnostis ,  SAMEE-UR-REHMAN

IPC: G03F7/20

Abstract: The disclosure relates to determining information about a patterning process. In one method, measurement data from a metrology process applied to each of a plurality of metrology targets on a substrate is obtained. The measurement data for each metrology target comprises at least a first contribution and a second contribution. The first contribution is from a parameter of interest of a patterning process used to form the metrology target. The second contribution is from an error in the metrology process. The method further comprises: using the obtained measurement data from all of the plurality of metrology targets to obtain information about an error in the metrology process; and using the obtained information about the error in the metrology process to extract a value of the parameter of interest for each metrology target.