公开(公告)号：US20150261100A1

公开(公告)日：2015-09-17

申请号：US14725023

申请日：2015-05-29

Applicant: ASML Netherlands B.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  David DECKERS ,  Sami MUSA

IPC: G03F7/20 ,  G01B9/02 ,  G01B11/27

CPC classification number: G03F7/70141 ,  G01B9/02 ,  G01B11/272 ,  G01D5/344 ,  G03F9/7046 ,  G03F9/7088

Abstract: An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.

Abstract translation: 对准测量系统测量物体上的对准目标。 测量照亮目标并被反射。 反射的测量光束被分离，其部分被不同的极化。 检测器接收反射的测量光束。 处理单元基于由检测器接收的测量波束来确定对准。 一种替代方案是使用光学色散光纤将从物体反射的多波长测量光束引导到检测器。