公开(公告)号：US20210375498A1

公开(公告)日：2021-12-02

申请号：US17395709

申请日：2021-08-06

Applicant: ASML Netherlands B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Sipke Jacob BIJLSMA ,  Olav Waldemar Vladimir FRIJNS ,  Andrey Alexandrovich NIKIPELOV ,  Nicolaas TEN KATE ,  Antonius Theodorus Anna Maria DERKSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Robert Gabriël Maria LANSBERGEN ,  Aukje Arianne Annette KASTELIJN

IPC: G21G1/10 ,  G21G1/12

Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.

公开(公告)号：US20190066859A1

公开(公告)日：2019-02-28

申请号：US15770688

申请日：2016-11-03

Applicant: ASML Netherlands B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Sipke Jacob BIJLSMA ,  Olav Waldemar Vladimir FRIJNS ,  Andrey Alexandrovich NIKIPELOV ,  Nicolaas TEN KATE ,  Antonius Theodorus Anna Maria DERKSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Robert Gabriël Maria LANSBERGEN ,  Aukje KASTELIJN

IPC: G21G1/10 ,  G21G1/12

Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).

公开(公告)号：US20190025706A1

公开(公告)日：2019-01-24

申请号：US16028917

申请日：2018-07-06

Applicant: ASML Netherlands B.V.

Inventor： Teis Johan COENEN ,  Sander Bas ROOBOL ,  Sipke Jacob BIJLSMA

IPC: G03F7/20 ,  G01N21/88 ,  G03F9/00 ,  G01N21/47

Abstract: In a method of determining an edge roughness parameter of a periodic structure, the periodic structure is illuminated (602) in an inspection apparatus. The illumination radiation beam may comprise radiation with a wavelength in the range 1 nm to 100 nm. A scattering signal (604) is obtained from a radiation beam scattered from the periodic structure. The scattering signal comprises a scattering intensity signal that is obtained by detecting an image of a far-field diffraction pattern in the inspection apparatus. An edge roughness parameter, such as Lined Edge Roughness and/or Line Width Roughness is determined (606) based on a distribution of the scattering intensity signal around a non-specular diffraction order. This may be done for example using a peak broadening model.