公开(公告)号：US20240077380A1

公开(公告)日：2024-03-07

申请号：US18262511

申请日：2022-01-05

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Koos VAN BERKEL ,  Victor Sebastiaan DOLK ,  Stijn Clyde Natalia THISSEN ,  Mauritius Gerardus Elisabeth SCHNEIDERS ,  Adrianus Hendrik KOEVOETS

IPC: G01M11/02 ,  G01K1/02 ,  G03F7/00

CPC classification number: G01M11/0242 ,  G01K1/026 ,  G03F7/705 ,  G03F7/706 ,  G03F7/70891

Abstract: A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating an irradiance profile for at least one optical element of the projection system from a power and illumination source pupil of the radiation beam, estimating a temperature distribution as a function of time in the at least one optical element of the projection system using the calculated irradiance profile for the at least one optical element of the projection system; calculating the thermally induced aberrations of the projection system based on the estimated temperature distribution and a thermal expansion parameter map associated with the at least one optical element of the projection system, wherein the thermal expansion parameter map is a spatial map indicating spatial variations of thermal expansion parameters in the at least one optical element of the projection system or a uniform map.