公开(公告)号：US11781996B1

公开(公告)日：2023-10-10

申请号：US18142340

申请日：2023-05-02

Applicant: AUROS TECHNOLOGY, INC.

Inventor： Ji-Hoon Kang ,  Hyun-Tae Kim

IPC: G01N21/956 ,  G01N21/95 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/103

Abstract: There are provided an overlay measuring device and a method for controlling a focus and a program therefor. An overlay measuring device controlling a focus in one embodiment includes an objective lens; a memory; a lens focus actuator operating the objective lens to adjust a distance between the objective lens and a wafer; and a processor controlling operations of the memory and the lens focus actuator, wherein the processor is configured to obtain a first height value in relation to each site of the wafer, match the obtained first height value and a corresponding site and store the same, and as initial measurement in relation to each site of the wafer starts, control the lens focus actuator, based on the stored first height value of the site, to control a Z-axis movement of the objective lens.