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公开(公告)号:US20220361336A1
公开(公告)日:2022-11-10
申请号:US17314131
申请日:2021-05-07
Applicant: Aplus Semiconductor Technologies Co., Ltd.
Inventor: Cheng-Neng Chen , Sui-Ho Tsai , Yun-Nan Wang , Chiao-Hui Wang
IPC: H05K1/14 , C23C14/34 , C23C18/16 , C25D5/02 , C25D5/10 , G03F7/004 , G03F7/20 , C23C28/02 , C23C14/58
Abstract: A metal circuit structure based on a flexible printed circuit (FPC) contains: a substrate, a first metal layer attached on the substrate, a second metal layer formed on the first metal layer, and an intermediate layer defined between the first metal layer and the second metal layer. A first surface of the intermediate layer is connected with the first metal layer, and a second surface of the intermediate layer is connected with the second metal layer. The intermediate layer is made of a first material, the second metal layer is made of a second material, and the first material of the intermediate layer does not act with the second material of the second metal layer.
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公开(公告)号:US12089331B2
公开(公告)日:2024-09-10
申请号:US17314131
申请日:2021-05-07
Applicant: Aplus Semiconductor Technologies Co., Ltd.
Inventor: Cheng-Neng Chen , Sui-Ho Tsai , Yun-Nan Wang , Chiao-Hui Wang
IPC: H05K1/14 , C23C14/34 , C23C14/58 , C23C18/16 , C23C28/02 , C25D5/02 , C25D5/10 , G03F7/004 , G03F7/20 , H05K1/11
CPC classification number: H05K1/147 , C23C14/34 , C23C14/5873 , C23C18/1637 , C23C28/023 , C25D5/022 , C25D5/10 , G03F7/0041 , G03F7/2016 , H05K1/11 , H05K2201/032 , H05K2201/0338 , H05K2201/0341
Abstract: A metal circuit structure based on a flexible printed circuit (FPC) contains: a substrate, a first metal layer attached on the substrate, a second metal layer formed on the first metal layer, and an intermediate layer defined between the first metal layer and the second metal layer. A first surface of the intermediate layer is connected with the first metal layer, and a second surface of the intermediate layer is connected with the second metal layer. The intermediate layer is made of a first material, the second metal layer is made of a second material, and the first material of the intermediate layer does not act with the second material of the second metal layer.
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