公开(公告)号：US20160215392A1

公开(公告)日：2016-07-28

申请号：US15001710

申请日：2016-01-20

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Kevin Griffin ,  Aaron Miller ,  Jeff Tobin ,  Eran Newman ,  Tatsuya E. Sato ,  Patricia M. Liu

IPC: C23C16/455

Abstract: Apparatus and methods for spatial atomic layer deposition are disclosed. The apparatus include a gas delivery system comprising a first gas flowing through a plurality of legs in fluid communication with a valve and a second gas flowing through a plurality of legs into the valves.

Abstract translation: 公开了用于空间原子层沉积的装置和方法。 该装置包括气体输送系统，其包括流过与阀流体连通的多个支腿的第一气体和流过多个支柱的阀的第二气体。

公开(公告)号：US20180294153A1

公开(公告)日：2018-10-11

申请号：US16008500

申请日：2018-06-14

Applicant: Applied Materials, Inc.

Inventor： Lara Hawrylchak ,  Jeff Tobin

IPC: H01L21/02 ,  H01L21/67

Abstract: Provided apparatus and methods for back side passivation of a substrate. The systems comprise an elongate support with an open top surface forming a support ring so that when a substrate is on the support ring, a cavity is formed within the elongate support. A plasma generator is coupled to the cavity to generate a plasma within the cavity to deposit a passivation film on the back side of the substrate.