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公开(公告)号:US10325799B2
公开(公告)日:2019-06-18
申请号:US14875392
申请日:2015-10-05
Applicant: Applied Materials, Inc.
Inventor: Dale R. Du Bois , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Ganesh Balasubramanian , Lipyeow Yap , Jianhua Zhou , Thomas Nowak
IPC: B05C13/00 , H01L21/68 , C23C16/458 , H01J37/32 , H01L21/687 , H01L21/324 , H01L21/67
Abstract: A method and apparatus for heating a substrate in a chamber are provided. an apparatus for positioning a substrate in a processing chamber. In one embodiment, the apparatus comprises a substrate support assembly having a support surface adapted to receive the substrate and a plurality of centering members for supporting the substrate at a distance parallel to the support surface and for centering the substrate relative to a reference axis substantially perpendicular to the support surface. The plurality of the centering members are movably disposed along a periphery of the support surface, and each of the plurality of centering members comprises a first end portion for either contacting or supporting a peripheral edge of the substrate.
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公开(公告)号:US11133210B2
公开(公告)日:2021-09-28
申请号:US16443185
申请日:2019-06-17
Applicant: Applied Materials, Inc.
Inventor: Dale R. Du Bois , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Ganesh Balasubramanian , Lipyeow Yap , Jianhua Zhou , Thomas Nowak
IPC: H01L21/324 , C23C16/458 , H01L21/68 , H01L21/687 , H01L21/67 , B05C13/00 , H01J37/32
Abstract: A method and apparatus for positioning and heating a substrate in a chamber are provided. In one embodiment, the apparatus comprises a substrate support assembly having a support surface adapted to receive the substrate and a plurality of centering fingers for supporting the substrate at a distance parallel to the support surface and for centering the substrate relative to a reference axis substantially perpendicular to the support surface. The plurality of the centering fingers are movably disposed along a periphery of the support surface, and each of the plurality of centering fingers comprises a first end portion for either contacting or supporting a peripheral edge of the substrate.
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