公开(公告)号：JP2013243377A

公开(公告)日：2013-12-05

申请号：JP2013140377

申请日：2013-07-04

Applicant: Applied Materials Inc ,  アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated

Inventor： RICHARD FOVELL ,  PAUL BRILLHART ,  YI SANG IN ,  ANISUL H KHAN ,  JIVKO DINEV ,  SHANE NEVIL

IPC: H01L21/3065 ,  C23C16/46 ,  H01L21/205 ,  H01L21/683

CPC classification number: F28D15/00 ,  F28D2021/0077 ,  H01L21/67109 ,  H01L21/67248

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for controlling the temperature of a substrate support.SOLUTION: In some embodiments, an apparatus for controlling the temperature of a substrate support 116 may include a first heat transfer loop 202 and a second heat transfer loop 210. The first heat transfer loop may have a first bath 204 with a first heat transfer fluid at a first temperature. The second heat transfer loop may have a second bath 212 with a second heat transfer fluid at a second temperature. The first and second temperatures may be the same or different. First and second flow controllers 206 and 214 may be provided for respectively providing the first and second heat transfer fluids to the substrate support. One or more return lines may couple one or more outlets of the substrate support to the first and second baths for returning the first and second heat transfer fluids to the first and second baths.

Abstract translation: 要解决的问题：提供一种用于控制基板支撑件的温度的方法和装置。解决方案：在一些实施例中，用于控制基板支撑件116的温度的装置可以包括第一热传递环路202和第二热量 第一传热回路可以具有在第一温度下具有第一传热流体的第一浴204。 第二传热回路可以具有在第二温度下具有第二传热流体的第二槽212。 第一和第二温度可以相同或不同。 第一和第二流量控制器206和214可以被提供用于分别将第一和第二传热流体提供给基板支撑件。 一个或多个返回线可以将衬底支撑件的一个或多个出口连接到第一和第二浴，以将第一和第二传热流体返回到第一和第二浴。

公开(公告)号：US20150340257A1

公开(公告)日：2015-11-26

申请号：US14645883

申请日：2015-03-12

Applicant: Applied Materials, Inc.

Inventor： PAUL BRILLHART ,  Joseph M. Ranish ,  Aaron Muir Hunter ,  Edric Tong ,  James Francis Mack ,  Kin Pong Lo ,  Errol Antonio C. Sanchez ,  Zhiyuan Ye ,  Anzhong Chang

IPC: H01L21/67 ,  H05B3/00 ,  G02B6/08

Abstract: Embodiments disclosed herein relate to a light pipe structure for thermal processing of semiconductor substrates. In one embodiment, a light pipe window structure for use in a thermal process chamber includes a transparent plate, and a plurality of light pipe structures formed in a transparent material that is coupled to the transparent plate, each of the plurality of light pipe structures comprising a reflective surface and having a longitudinal axis disposed in a substantially perpendicular relation to a plane of the transparent plate.

Abstract translation: 本文公开的实施例涉及用于半导体衬底的热处理的光管结构。 在一个实施例中，用于热处理室的光管窗结构包括透明板和形成在透明材料中的多个光管结构，所述多个光管结构联接到透明板，所述多个光管结构中的每一个包括 反射表面并且具有设置在与透明板的平面基本上垂直的方向上的纵向轴线。

公开(公告)号：US20140116336A1

公开(公告)日：2014-05-01

申请号：US14051010

申请日：2013-10-10

Applicant: APPLIED MATERIALS, INC.

Inventor： PAUL BRILLHART ,  DAVID ABERLE

IPC: B05B1/00

CPC classification number: B05B1/005 ,  C23C16/4412 ,  C30B25/14

Abstract: Exhaust systems for substrate process chambers are provided herein. In some embodiments, an exhaust for a process chamber configured to process a substrate having a given width may include a body having an internal cavity and an opening disposed in a first side of the body, the opening fluidly coupled to the internal cavity; a plurality of through holes disposed through a second side of the body, the plurality of through holes fluidly coupled to the internal cavity, wherein the plurality of through holes are disposed symmetrically about the body with respect to a central axis of the body such that the plurality of through holes provide an equal length and pressure drop from the opening to each respective through hole; and a plurality of conduits, each having a first open end respectively coupled to the plurality of through holes.

Abstract translation: 本文提供了衬底处理腔室的排气系统。 在一些实施例中，用于处理具有给定宽度的基板的处理室的排气可以包括具有内部空腔和设置在主体的第一侧中的开口的主体，该开口流体地联接到内部空腔; 多个穿过所述主体的第二侧的通孔，所述多个通孔流体地联接到所述内部空腔，其中所述多个通孔围绕所述主体相对于所述主体的中心轴对称地设置，使得所述多个通孔 多个通孔提供从开口到每个相应通孔的相同长度和压降; 以及多个管道，每个管道具有分别联接到所述多个通孔的第一开口端。

公开(公告)号：US20150037017A1

公开(公告)日：2015-02-05

申请号：US14324557

申请日：2014-07-07

Applicant: APPLIED MATERIALS, INC.

Inventor： SHU-KWAN LAU ,  JOSEPH M. RANISH ,  PAUL BRILLHART ,  MEHMET TUGRUL SAMIR

IPC: H05B3/00

CPC classification number: H05B3/0047 ,  F27D5/0037

Abstract: Methods and apparatus are provided for reducing the thermal signal noise in process chambers using a non-contact temperature sensing device to measure the temperature of a component in the process chamber. In some embodiments, a susceptor for supporting a substrate in a process chamber includes a first surface comprising a substrate support surface; and a second surface opposite the first surface, wherein a portion of the second surface comprises a feature to absorb incident radiant energy.

Abstract translation: 提供的方法和装置用于使用非接触式温度感测装置来减小处理室中的热信号噪声，以测量处理室中的部件的温度。 在一些实施例中，用于在处理室中支撑衬底的基座包括包括衬底支撑表面的第一表面; 以及与第一表面相对的第二表面，其中第二表面的一部分包括吸收入射辐射能的特征。

公开(公告)号：US20130298832A1

公开(公告)日：2013-11-14

申请号：US13865672

申请日：2013-04-18

Applicant: APPLIED MATERIALS, INC.

Inventor： JOSEPH M. RANISH ,  PAUL BRILLHART ,  SATHEESH KUPPURAO ,  DONGMING IU

IPC: C30B25/10 ,  F21V7/00

CPC classification number: C30B25/105 ,  F21V7/0083

Abstract: Apparatus for processing a substrate are provided herein. In some embodiments, a lamphead for use in substrate processing includes a monolithic member having a contoured surface; a plurality of reflector cavities disposed in the contoured surface, wherein each reflector cavity is shaped to act as a reflector or to receive a replaceable reflector for a lamp; and a plurality of lamp passages, wherein each lamp passage extends into the monolithic member from one of the plurality of reflector cavities.

Abstract translation: 本文提供了用于处理基板的装置。 在一些实施例中，用于衬底处理的灯头包括具有轮廓表面的整体构件; 设置在轮廓表面中的多个反射器空腔，其中每个反射器腔被成形为用作反射器或接收用于灯的可更换反射器; 以及多个灯通道，其中每个灯通道从所述多个反射器腔中的一个延伸到所述整体构件中。