公开(公告)号：US20250167021A1

公开(公告)日：2025-05-22

申请号：US18918276

申请日：2024-10-17

Applicant: Axcelis Technologies, Inc.

Inventor： Phillip Geissbuhler ,  Neil Bassom ,  David Hoglund ,  Vladimir Romanov

IPC: H01L21/67 ,  C23C14/48 ,  C23C14/54 ,  G01N21/88 ,  G01N21/958

Abstract: An ion implantation system includes a sensor for monitoring depositions of particles or flakes of other materials. The sensor monitors film thickness on a clear panel from behind the clear panel by emitting light and detecting reflections from the light. The system generates an alert for a buildup thickness. The composition of the film may also be detected by the sensor.