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    METAL/METAL OXIDE ELECTRODE FOR BASE DETERMINATION
    2.
    发明专利
    METAL/METAL OXIDE ELECTRODE FOR BASE DETERMINATION 失效

    公开(公告)号：JPH03179247A

    公开(公告)日：1991-08-05

    申请号：JP23728690

    申请日：1990-09-10

    Applicant: BASF AG

    Inventor： BUORUFUGANGU HAABERUMAN ,  AKUSERU ANDERUROORU ,  BUORUFUGANGU SHIYUTAINAA

    IPC: G01N27/333 ,  G01N27/30

    Abstract: PURPOSE: To enable continuously detecting the concentration of trace chlorine even when hydrogen, oxygen, etc., exist, by constituting an electrode for chlorine determination, with a core of metal tantalum and a non-porous-gap layer of tantalum lower oxide which covers the core surface. CONSTITUTION: A metal/metal oxide electrode for determining the potential and the current of chlorine in acid electrolytic aqueous solution is constituted of a metal tantalum core and a non-porous-gap layer of tantalum lower oxide which covers the core surface. The tantalum lower oxide is shown by a formula Ta2 O5- X. The X average value in the lower oxide outer layer having a thickness of 20-40Å is 0.01-0.1. It is desirable that the X value in the layer in the vicinity of metal is 0.1 to 2. As to the metal/metal oxide electrode, the total thickness of the tantalum lower oxide layer is desirable to be 80-120Å. The tantalum lower oxide is formed in the following manner; on the metal tantalum core, back-sputtering treatment is performed in a noble gas atmosphere at 5×10 -5×10 millibar, the tantalum surface is oxidized by oxygen at -200-+200 deg.C, and the surface is treated in hydrochloric acid aqueous solution containing chlorine.

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