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公开(公告)号:DE59606605D1
公开(公告)日:2001-04-19
申请号:DE59606605
申请日:1996-12-19
Applicant: BASF AG
Inventor: KLAEUI WOLFGANG , DOMHOEVER BERND
IPC: C07F5/05 , B01J31/18 , C07C2/26 , C07C2/32 , C07C2/36 , C07F15/00 , C07F15/04 , C07F19/00 , C08F4/14 , C08F4/20 , C08F4/26 , C08F4/70 , C08F4/80 , C08F10/00 , C08G67/02
Abstract: PCT No. PCT/EP96/05715 Sec. 371 Date Jun. 16, 1998 Sec. 102(e) Date Jun. 16, 1998 PCT Filed Dec. 19, 1996 PCT Pub. No. WO97/23492 PCT Pub. Date Jul. 3, 1997Metal complexes of the formula (I) or (I') are suitable for the oligomerization and polymerization of olefinically unsaturated compounds and for the copolymerization thereof with carbon monoxide M is a metal from sub-group eight of the Periodic Table of the Elements, E is an element from main group five of the Periodic Table of the Elements, R1 to R11, R15 are substituents selected from the group consisting of hydrogen, C1- to C30-organocarbon radicals and C3- to C30-organosilicon radicals, and R12 to R14 are substituents selected from the group consisting of C1- to C30-organocarbon radicals and C3- to C30-organosilicon radicals.
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公开(公告)号:DE19548146C1
公开(公告)日:1997-11-20
申请号:DE19548146
申请日:1995-12-21
Applicant: BASF AG
Inventor: KLAEUI WOLFGANG PROF DR , DOMHOEVER BERND
IPC: C07F5/05 , B01J31/18 , C07C2/26 , C07C2/32 , C07C2/36 , C07F15/00 , C07F15/04 , C07F19/00 , C08F4/14 , C08F4/20 , C08F4/26 , C08F4/70 , C08F4/80 , C08F10/00 , C08G67/02 , B01J31/24
Abstract: PCT No. PCT/EP96/05715 Sec. 371 Date Jun. 16, 1998 Sec. 102(e) Date Jun. 16, 1998 PCT Filed Dec. 19, 1996 PCT Pub. No. WO97/23492 PCT Pub. Date Jul. 3, 1997Metal complexes of the formula (I) or (I') are suitable for the oligomerization and polymerization of olefinically unsaturated compounds and for the copolymerization thereof with carbon monoxide M is a metal from sub-group eight of the Periodic Table of the Elements, E is an element from main group five of the Periodic Table of the Elements, R1 to R11, R15 are substituents selected from the group consisting of hydrogen, C1- to C30-organocarbon radicals and C3- to C30-organosilicon radicals, and R12 to R14 are substituents selected from the group consisting of C1- to C30-organocarbon radicals and C3- to C30-organosilicon radicals.
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