中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

9 records (took 0.021 seconds)

    NEW SUBSTITUTED SULFONYLUREA
    6.
    发明专利
    NEW SUBSTITUTED SULFONYLUREA 失效

    公开(公告)号：JPH02207076A

    公开(公告)日：1990-08-16

    申请号：JP32159989

    申请日：1989-12-13

    Applicant: BASF AG

    Inventor： HORUSUTO MAIYAA ,  GEERUHARUTO HAMUPUREHITO ,  BURUUNO BUYURUTSUAA ,  KAARUUOTSUTOO BUESUTOFUAREN

    IPC: C07D251/16 ,  A01N47/36 ,  A01N47/38 ,  C07D239/47 ,  C07D239/52 ,  C07D251/42 ,  C07D251/46 ,  C07D403/12 ,  C07D413/12 ,  C07D521/00

    Abstract: Substituted sulfonylureas of the formula I I where the substituents and indices have the following meanings: x is oxygen or sulfur; z is nitrogen or methine (=CH-); R1 is halogen or substituted or unsubstituted C1-C4-alkoxycarbonyl or C1-C3-alkoxy, or a radical -CONR6R7, where R6 is hydrogen, C1-C8-alkyl or C1-C6-alkoxy and R7 is hydrogen or C1-C8-alkyl; R2 is halogen or substituted or unsubstituted C1-C4-alkoxy or C1-C4-alkyl; R3 is C1-C4-alkyl, C1-C4-alkylthio, C1-C4-haloalkyl, C1-C4-haloalkoxy, C1-C4-haloalkylthio, halogen, cyano, nitro, amino, mono-C1-C4-alkylamino, di-C1-C4-alkylamino, C2-C6-alkenyl, C1-C4-alkoxycarbonyl, C1-C4-alkanoyl or benzyl; a 5- or 6-membered saturated heterocycle which is attached by its nitrogen atom and which, besides methylene and a nitrogen, may also contain an oxygen or a sulfur atom; or, bonded to adjacent ring positions, -OCRR'O-, where R and R' are each hydrogen or C1-C4-alkyl; R4 is hydrogen or C1-C4-alkyl; R5 is halogen C1-C4-alkyl, C1-C4-alkoxy, C1-C4-alkylthio or C1-C4-haloalkyl; m is from 0 to 3 or, when R3 is halogen, from 0 to 5, differences among the R3 radicals being possible when m is 2 or 3; and n is from 0 to 2, a difference between the R5 radicals being possible when n is 2; and environmentally acceptable salts thereof, processes for their manufacture, and their use as herbicidal agents.

Patent Agency Ranking