PROCESS OF SEPARATING SMALL AMOUNT OF A FRACTION MIDDLE-BOILING COMPONENTS FROM A LIQUID MIXTURE BY DISTILLATION

    公开(公告)号:CZ284069B6

    公开(公告)日:1998-08-12

    申请号:CS30490

    申请日:1990-01-22

    Applicant: BASF AG

    Abstract: Process for the separation by distillation of small quantities of a middle-boiling fraction from a liquid mixture by means of a distillation column (main column), comprising a rectification and a stripping component, where the liquid mixture contains relatively large amounts of higher- and lower-boiling constituents, and the rectification component being connected to the upper end and the stripping component to the lower end of a second distillation column (side column), and the middle-boiling fraction being removed in vapour or liquid form from its middle region, the concentration of the middle-boiling fraction in the liquid mixture being less than 2%, preferably less than 0.1%, and the amount of vapour introduced into the side column at its lower end from the main column being 1 to 20%, preferably 3 to 10%, relative to the amount of vapour in the main column at the relevant point.

    PROCESS OF DISTILLATION SEPARATION OF SMALL AMOUNTS OF FRACTION OF MEDIUM BOILING COMPONENTS OF A LIQUID MIXTURE

    公开(公告)号:CZ30490A3

    公开(公告)日:1998-05-13

    申请号:CS30490

    申请日:1990-01-22

    Applicant: BASF AG

    Abstract: Process for the separation by distillation of small quantities of a middle-boiling fraction from a liquid mixture by means of a distillation column (main column), comprising a rectification and a stripping component, where the liquid mixture contains relatively large amounts of higher- and lower-boiling constituents, and the rectification component being connected to the upper end and the stripping component to the lower end of a second distillation column (side column), and the middle-boiling fraction being removed in vapour or liquid form from its middle region, the concentration of the middle-boiling fraction in the liquid mixture being less than 2%, preferably less than 0.1%, and the amount of vapour introduced into the side column at its lower end from the main column being 1 to 20%, preferably 3 to 10%, relative to the amount of vapour in the main column at the relevant point.

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