3.
    发明专利
    未知

    公开(公告)号:DE2307376A1

    公开(公告)日:1974-08-22

    申请号:DE2307376

    申请日:1973-02-15

    Applicant: BASF AG

    Inventor: KROME GERD

    Abstract: 1454028 Vinyl chloride BASF AG 14 Feb 1974 [15 Feb 1973] 6676/74 Heading C2C Vinyl chloride is produced by cleavage of dichloroethane to form a product mixture of vinyl chloride and HCl together with unreacted dichloroethane and unsaturated impurities, removal of the HCl formed, and adding 0À01-1 wt. per cent of Cl 2 (based on the dichloroethane originally used) to the reaction mixture after the cleavage reaction to react with unsaturated impurities and subsequently recovering the vinyl chloride by separation from the dichloroethane and chlorinated impurities. The Cl 2 is preferably dissolved in some of the unreacted ClCH 2 CH 2 Cl after separation from the vinyl chloride and the resulting mixture is added to the reaction mixture after removal of HCl. Alternatively Cl 2 may be added prior to the removal of HCl. The reaction with Cl 2 may be performed at 20‹ to 100‹ C. using 0À1-0À6 wt. per cent Cl 2 , in order to react with butadiene, chloroprene and monovinylacetylene impurities in the vinyl chloride.

    PRODUCTION OF VINYL CHLORIDE
    5.
    发明专利

    公开(公告)号:CA1018549A

    公开(公告)日:1977-10-04

    申请号:CA192149

    申请日:1974-02-07

    Applicant: BASF AG

    Inventor: KROME GERD

    Abstract: 1454028 Vinyl chloride BASF AG 14 Feb 1974 [15 Feb 1973] 6676/74 Heading C2C Vinyl chloride is produced by cleavage of dichloroethane to form a product mixture of vinyl chloride and HCl together with unreacted dichloroethane and unsaturated impurities, removal of the HCl formed, and adding 0À01-1 wt. per cent of Cl 2 (based on the dichloroethane originally used) to the reaction mixture after the cleavage reaction to react with unsaturated impurities and subsequently recovering the vinyl chloride by separation from the dichloroethane and chlorinated impurities. The Cl 2 is preferably dissolved in some of the unreacted ClCH 2 CH 2 Cl after separation from the vinyl chloride and the resulting mixture is added to the reaction mixture after removal of HCl. Alternatively Cl 2 may be added prior to the removal of HCl. The reaction with Cl 2 may be performed at 20‹ to 100‹ C. using 0À1-0À6 wt. per cent Cl 2 , in order to react with butadiene, chloroprene and monovinylacetylene impurities in the vinyl chloride.

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