公开(公告)号：JPH0211534A

公开(公告)日：1990-01-16

申请号：JP10924389

申请日：1989-05-01

Applicant: BASF AG

Inventor： RAINAA BETSUKAA ,  HAINTSU ETSUKARUTO ,  MANFUREETO ETSUGERUSUDORUFUAA ,  GERUHARUTO SHINDORAA ,  KURAASU YANSEN

IPC: C07C43/16 ,  C07C41/00 ,  C07C43/15 ,  C07C67/00 ,  C11B9/00

公开(公告)号：JPH03109341A

公开(公告)日：1991-05-09

申请号：JP22268490

申请日：1990-08-27

Applicant: BASF AG

Inventor： MIHIYAERU HIYUURUMAN ,  RAINAA BETSUKAA ,  ROOTAA YANICHIYUKE ,  GERARUDO RAUTAABATSUHA ,  BUORUFUGANGU BARUSU ,  KURAASU YANSEN

IPC: C07C29/14 ,  C07C33/05 ,  C07C33/12 ,  C07C33/14 ,  C07C45/68 ,  C07C47/225 ,  C07D309/04 ,  C07D309/30 ,  C07D309/32 ,  C07D311/96 ,  C07D493/10 ,  C11B9/00 ,  C11D3/50

Abstract: Cycloalkylidene derivatives of the general formulae Ia to Ic Ia Ib Ic where the dashed line is a possible additional chemical bond, the radicals R1 are identical or different C1-C4-alkenyl groups, R2 and R3 are each methyl or ethyl, R4 is hydrogen or one of the radicals R1, X is oxygen, methylene or a chemical bond, m is from 0 to 3 or, when X is methylene, is from 1 to 3, or, when X is methylene and R1 is methyl, is from 2 to 3 and n is from 0 to 3, are used as fragrance materials.

公开(公告)号：JPH02306954A

公开(公告)日：1990-12-20

申请号：JP11073190

申请日：1990-04-27

Applicant: BASF AG

Inventor： GERARUTO RAUTAABATSUHA ,  RAINAA BETSUKAA ,  KURAASU YANSEN

IPC: A61K8/00 ,  A61K8/40 ,  A61K8/49 ,  A61Q13/00 ,  C07C255/07 ,  C07C255/16 ,  C07C255/34 ,  C07C255/37 ,  C07D317/60 ,  C11B9/00 ,  C11D3/50