公开(公告)号：DE10213027A1

公开(公告)日：2003-03-13

申请号：DE10213027

申请日：2002-03-22

Applicant: BASF AG

Inventor： ARNOLD HEIKO ,  ASKANI RAINER ,  HAMMON ULRICH ,  PAUWELS JOHN

IPC: B08B9/02 ,  B08B9/08 ,  C07C51/44 ,  C07C57/07 ,  B08B3/08

Abstract: Process for cleaning an apparatus in which organic solvents containing (meth)acrylic acids are treated and/or produced comprises rinsing the apparatus initially with (meth)acrylic acid, then with water, and finally with an aqueous solution of a basic salt. Preferred Features: The apparatus is a rectification column, an adsorption column, a desorption column and/or an extraction column, or an evaporator or a heat exchanger. The aqueous solution of the basic salt is an aqueous solution of KOH and/or NaOH.