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公开(公告)号:SE7714281L
公开(公告)日:1978-06-19
申请号:SE7714281
申请日:1977-12-15
Applicant: BASF AG
Inventor: KOPLIN E , HIFFMANN H , RAIFF S , RICHTER P , KAUFMANN H
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公开(公告)号:SE7714281A
公开(公告)日:1978-06-19
申请号:SE7714281
申请日:1977-12-15
Applicant: BASF AG
Inventor: KOPLIN E , HIFFMANN H , RAIFF S , RICHTER P , KAUFMANN H
CPC classification number: G03F7/3085 , G03F7/40
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公开(公告)号:DK137601B
公开(公告)日:1978-04-03
申请号:DK524574
申请日:1974-10-07
Applicant: BASF AG
Inventor: ZUERGER M , ELZER A , RICHTER P , WIGGER A , WERTHER H U
Abstract: The invention relates to relief plates for flexographic printing comprising a relatively soft elastomeric base (U) having a modulus of elasticity of from 10 to 200 kg/cm2 and a thickness of from 0.5 to 6 mm and, firmly bonded thereto, a thin, relatively hard, difficultly soluble intermediate layer Z having a modulus of elasticity of from 1 x 103 to 2.1 x 106 kg/cm2 and a thickness of from 5 to 500 mu and, firmly bonded to said intermediate layer Z, a relief layer P' consisting of a photocrosslinked elastomeric mixture having a modulus of elasticity of from 30 to 2000 kg/cm2 and a thickness of from 200 to 300 mu , the modulus of elasticity of the photocrosslinked relief layer P' being the same as or higher than that of the base U and the neutral surface of the relief plate lying in or near the intermediate layer Z. The invention also relates to photosensitive laminates for the production of such plates.
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公开(公告)号:SE408097B
公开(公告)日:1979-05-14
申请号:SE7412548
申请日:1974-10-04
Applicant: BASF AG
Inventor: SUERGER M , ELZER A , RICHTER P , WIGGER A , WERTHER H-U
Abstract: The invention relates to relief plates for flexographic printing comprising a relatively soft elastomeric base (U) having a modulus of elasticity of from 10 to 200 kg/cm2 and a thickness of from 0.5 to 6 mm and, firmly bonded thereto, a thin, relatively hard, difficultly soluble intermediate layer Z having a modulus of elasticity of from 1 x 103 to 2.1 x 106 kg/cm2 and a thickness of from 5 to 500 mu and, firmly bonded to said intermediate layer Z, a relief layer P' consisting of a photocrosslinked elastomeric mixture having a modulus of elasticity of from 30 to 2000 kg/cm2 and a thickness of from 200 to 300 mu , the modulus of elasticity of the photocrosslinked relief layer P' being the same as or higher than that of the base U and the neutral surface of the relief plate lying in or near the intermediate layer Z. The invention also relates to photosensitive laminates for the production of such plates.
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