公开(公告)号：DE2639287B1

公开(公告)日：1978-01-26

申请号：DE2639287

申请日：1976-09-01

Applicant: BASF AG

Inventor： SIMMLER WERNER DIPL-ING DR ,  MARQUARDT SIEGFRIED ING ,  STINGL WALTER ,  DIEM HANS DIPL-CHEM DR ,  DUDECK CHRISTIAN DIPL-CHEM DR

IPC: C23C18/44 ,  C23C3/02

Abstract: Metallic Ag is reductively deposited on non-metallic substrates by (1) pretreating the substrates with hydrazine, or hydrazine derivs., and then (2) immersing in Ag solns. contg. aminoacids (I) having formula NH2-R1-COOH, NH(R1COOH)(R2COOH) and/or N(R1COOH)(R2COOH) (R3COOH)(where R1, R2 and R3 are opt. different hydrocarbyl gps.). Pref. (I) may be added during prepn. of the Ag salt solns. Quantity of (I) is 0.02-0.3 mol/g. atom of dissolved Ag. Bath may be alkaline, neutral or acid, and is kept at 0-100 (1-30) degrees C, e.g. for 1-10 (2-5) min. Process is opt. combined with electrodeposition. Substrates may be Al2O3, graphite, coke, active C, glass, ceramic, plastic or textile fibres. Substrate require no preliminary surface activation or sensiting. Ag layers of opt. thickness and high conductivity can be achieved by a 1-step treatment. Ag yield reaches >80%.