1.
    发明专利
    未知

    公开(公告)号:NO20031040L

    公开(公告)日:2003-05-06

    申请号:NO20031040

    申请日:2003-03-06

    Applicant: BASF AG

    Abstract: Compounds which contain one or more groups of the formula (I) -CH2-CH(NR R )- (I)where R and R , independently of one another, are each hydrogen, C1-20-alkyl, C6-18-aryl, C7-20-alkaryl, C7-20-aralkyl or a polyamine radical, are prepared by reductive amination of compounds which contain one or more groups of the formula (II) -CH2-CH(O-C(O)-R )- (II)where R is hydrogen, C1-20-alkyl, C6-18-aryl, C7-20-alkaryl or C7-20-aralkyl, with amines of the formula (III) HNR R (III)and hydrogen.

    3.
    发明专利
    未知

    公开(公告)号:NO20031040D0

    公开(公告)日:2003-03-06

    申请号:NO20031040

    申请日:2003-03-06

    Applicant: BASF AG

    Abstract: Compounds which contain one or more groups of the formula (I) -CH2-CH(NR R )- (I)where R and R , independently of one another, are each hydrogen, C1-20-alkyl, C6-18-aryl, C7-20-alkaryl, C7-20-aralkyl or a polyamine radical, are prepared by reductive amination of compounds which contain one or more groups of the formula (II) -CH2-CH(O-C(O)-R )- (II)where R is hydrogen, C1-20-alkyl, C6-18-aryl, C7-20-alkaryl or C7-20-aralkyl, with amines of the formula (III) HNR R (III)and hydrogen.

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