公开(公告)号：US20240060201A1

公开(公告)日：2024-02-22

申请号：US17753653

申请日：2020-09-08

Applicant: BASF SE

Inventor： Marco ARNOLD ,  Alexander FLUEGEL ,  Elisabeth KUTTNER ,  Doris KREMZOW-GRAW ,  Nadine ENGELHARDT ,  Johannes KASCHEL

IPC: C25D3/32 ,  C25D3/64 ,  C07C321/20 ,  C07C335/18 ,  C07D213/32 ,  C07D277/26 ,  C07D233/60

CPC classification number: C25D3/32 ,  C25D3/64 ,  C07C321/20 ,  C07C335/18 ,  C07D213/32 ,  C07D277/26 ,  C07D233/60

Abstract: An aqueous composition including (a) metal ions including tin ions and silver ions and (b) at least one complexing agent of formula C11


RC12-XC11-RC11   (C11)

and their salts,



where
XC11 is selected from

(a) a divalent 5 or 6 membered aromatic N-heterocyclic group;
(b) a divalent 6 membered aromatic carbocyclic group; and
(c) a divalent 5 or 6 membered aliphatic N-heterocyclic group including one N atom and optionally a second heteroatom selected from N and O;


 all of which may be unsubstituted or substituted by one or more OH or one or more RC14;
RC11 is selected from










 ; and
RC12 is selected from RC11, XC11-RC11, H, OH, NRC142, C1 to C10 alkyl, and C1 to C10 alkoxy

公开(公告)号：US20230265576A1

公开(公告)日：2023-08-24

申请号：US18005171

申请日：2021-06-30

Applicant: BASF SE

Inventor： Charlotte EMNET ,  Verena STREMPEL ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Robert BRAENDLE ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

IPC: C25D3/38

CPC classification number: C25D3/38

Abstract: Described herein is an acidic aqueous composition for copper electroplating including

(a) copper ions;
(b) bromide ions; and
(c) at least one additive of formula S1






where
XS1 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl;
RS1 is a monovalent

(a) poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group, or
(b) a poly(oxyethylene)-block-poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group;


RS2, RS3, RS4

(a) are selected from the group consisting of H, RS1, RS40, or
(b) RS3 and an adjacent group RS4 or, if n>2, two adjacent groups RS4 may together form a divalent group XS3;


RS40 is selected from the group consisting of (a) linear or branched C1-C20 alkyl, and (b) linear or branched C1-C20 alkenyl;
XS3 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl; and
n is an integer of from 1 to 6.

公开(公告)号：US20220298664A1

公开(公告)日：2022-09-22

申请号：US17805144

申请日：2022-06-02

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Lucas Benjamin HENDERSON

IPC: C25D3/18 ,  C25D7/12 ,  C25D5/02

Abstract: Described herein is a cobalt electrodeposition composition including cobalt ions, and particular leveling agents including X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, where X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11— and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, and X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20190309429A1

公开(公告)日：2019-10-10

申请号：US16468467

申请日：2017-12-19

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexandra HAAG ,  Charlotte EMNET ,  Alexander FLUEGEL

IPC: C25D3/32 ,  C25D3/38 ,  C25D7/12 ,  H01L21/288

Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.

公开(公告)号：US20250051949A1

公开(公告)日：2025-02-13

申请号：US18720906

申请日：2022-12-20

Applicant: BASF SE

Inventor： Charlotte EMNET ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

IPC: C25D3/38 ,  C25D5/00 ,  C25D7/12

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including
(a) copper ions;
(b) a grain refiner of formula G1a or G1b or salts thereof; (c) a complexing agent; and
(d) optionally a buffer or a base to adjust the pH to a pH of from 7 to 13;
wherein
RG1 is selected from one or more H, C1 to C4 carboxyl, C1 to C4 alkyl, C1 to C6 alkoxy, halogen, and CN;
RG2 is selected from one or more H, C1 to C4 carboxyl, C1 to C4 alkyl, C1 to C6 alkoxy, halogen, and CN; and
XG1 is selected from C1 to 6 alkanediyl or a group —XG11—C(O)—O—XG12—;
XG11 is selected from a chemical bond or C1 to C4 alkandiyl;
XG12 is selected from a chemical bond or C1 to C4 alkandiyl; and wherein RG1 or RG2, comprises at least one C1 to C4 carboxyl group, or group XG1 is —XG11—C(O)—O—)—XG12—; wherein the pH of the composition is from 7 to 13.

公开(公告)号：US20230235471A1

公开(公告)日：2023-07-27

申请号：US18001078

申请日：2021-06-07

Applicant: BASF SE

Inventor： Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Nadine ENGELHARDT

IPC: C25D3/38 ,  C08G73/02 ,  C08K3/08 ,  C08K5/3415 ,  C25D7/12

CPC classification number: C25D3/38 ,  C08G73/024 ,  C08K3/08 ,  C08K5/3415 ,  C25D7/12 ,  C08K2003/085

Abstract: Disclosed herein is a A polyalkanolamine including the structure of formula L1









A
L




n






B
L




m





wherein

AL is





BL is




-






O-X


L21





o

-,














XL1, XL2, XL3 are independently selected from a C1 to C6 alkanediyl;
ArL is a 5 or 6 membered N-heteroaromatic ring system including from 1 to 4 N atoms, which may be unsubstituted or substituted by C1 to C6 alkyl;
n is an integer of from 2 to 350;
m is 0 or an integer of from 1 to 600;
o is 1 or an integer of from 2 to 25;
BL1 is a continuation of the backbone BL by branching;
XL11, XL12, XL13 are independently selected from a C1 to C6 alkanediyl;
XL21 is a C1 to C6 alkanediyl;

and derivatives thereof obtainable by N-protonation, N-quaternization, substitution, or polyalkoxylation.

公开(公告)号：US20220333262A1

公开(公告)日：2022-10-20

申请号：US17754097

申请日：2020-09-15

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Alexander FLUEGEL ,  Marco ARNOLD ,  Charlotte EMNET

IPC: C25D1/00

Abstract: Disclosed herein is a composition for copper bump electrodeposition including copper ions and at least one additive including a polyalkyleneimine backbone including N-hydrogen atoms, where (a) the polyalkyleneimine backbone has a mass average molecular weight Mw of from 900 g/mol to 100 000 g/mol, (b) the N-hydrogen atoms are each substituted by a C2 to C6 polyoxyalkylene group, and (c) the average number of oxyalkylene units in the polyoxyalkylene group is from more than 10 to less than 30 per N-hydrogen atoms in the polyalkyleneimine.

公开(公告)号：US20220119972A1

公开(公告)日：2022-04-21

申请号：US17566426

申请日：2021-12-30

Applicant: BASF SE

Inventor： Alexander FLUEGEL ,  Marco ARNOLD ,  Nadine ENGELHARDT ,  Marcel Patrik KIENLE

IPC: C25D3/32

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R11 is selected from H, R11, R40, R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

公开(公告)号：US20200347503A1

公开(公告)日：2020-11-05

申请号：US16762717

申请日：2018-11-19

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Lucas Benjamin HENDERSON

IPC: C25D3/18 ,  C25D7/12

Abstract: A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, wherein X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11—, and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20250129503A1

公开(公告)日：2025-04-24

申请号：US18691755

申请日：2022-09-23

Applicant: BASF SE

Inventor： Marco ARNOLD ,  Alexander FLUEGEL ,  Elisabeth KUTTNER ,  Nadine ENGELHARDT

IPC: C25D3/38 ,  C08G73/02 ,  C25D7/12 ,  H01L21/288

Abstract: Described herein is a copper electroplating composition including copper ions, an acid, and at least one polyaminoamide including a group of formula L1 [B-A-B′—Z]n[Y—Z]m  (L1) that is obtainable by reacting a diamine compound including two primary or secondary amino groups with an amino acid in a molar ratio of approx. 1:2 to form an aminoamide compound that is afterwards reacted with a coupling agent and optionally with a diamine co-monomer.