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1.发明专利
公开(公告)号：MY156728A
公开(公告)日：2016-03-15
申请号：MYPI2011004466
申请日：2010-03-31
Applicant: BASF SE
Inventor： CORNELIA ROGER-GOPFERT , BENEDIKT RAETHER ROMAN , CHARLOTTE EMNET , ALEXANDRA HAAG , DIETER MAYER
IPC: C25D3/38
Abstract: COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING COMPOSITION COMPRISING A SOURCE OF METAL IONS AND AT LEAST ONE SUPPRESSING AGENT OBTAINABLE BY REACTING A) AN AMINE COMPOUND COMPRISING AT LEAST THREE ACTIVE AMINO FUNCTIONAL GROUPS WITH B) A MIXTURE OF ETHYLENE OXIDE AND AT LEAST ONE COMPOUND SELECTED FROM C3 AND C4 ALKYLENE OXIDES.
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