Abstract:
PROBLEM TO BE SOLVED: To provide compounds used for controlling plant pathogen fungi and methods for producing the same. SOLUTION: Provided are 5,6-dialkyl-7-aminotriazolopyrimidines expressed by formula (I) (wherein substituents are defined as follows: R 1 represents an alkyl or alkoxyalkyl; R 2 represents an alkyl, R 1 and R 2 may be substituted with following 1-3 groups: cyano, nitro, hydroxy, a 3-6C cycloalkyl, 1-6C alkylthio and NRaRb; Ra and Rb represent H or a 1-6C alkyl). COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a compound for protecting a phytopathogenic fungus and a drug containing the same. SOLUTION: The present invention relates to a 5, 6-dialkyl-7-amino-triazolopyrimidine compound represented by formula (I): (wherein R 1 is alkyl or alkoxyalkyl wherein aliphatic groups may be substituted by 1-3 following groups: cyano, nitro, hydroxyl, 3-6C cycloalkyl, 1-6C alkylthio and NR a R b ; R 2 is CHR 3 CH 3 , cyclopropyl, CH=CH 2 or CH 2 CH=CH 2 , and R 3 is hydrogen, CH 3 or CH 2 CH 3 ), and to the drug containing the same. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
The invention also relates to a method for stain resistance and penetration resistance of aqueous coating compositions which method comprises providing a coating composition which contain at least one pigment, at least one film-forming polymer in the form of an aqeuous polymer dispersion and at least one anionic surfactant, wherein the anionic surfactant comprises at least 85 % by weight, preferably at least 90 % by weight, more preferably at least 95 % by weight, based on the total weight of anionic surfactant in the coating composition, of at least one anionic surfactant S, which is selected from semi-esters of sulfuric acid or phosphoric acid with an alcohol, which alcohol carries at least one alkyl radical having from 8 to 30 carbon atoms or an alkyl substituted phenyl radical wherein alkyl has from 4 to 30 carbon atoms and which alcohol may carry an oligo-C 2 -C 3 -alkylene-ether group provided that the number of repeating units in the oligo-C 2 -C 3 -alkylene-ether group is at most 15, or a salt thereof.