公开(公告)号：US10801105B2

公开(公告)日：2020-10-13

申请号：US15775856

申请日：2016-11-18

Applicant: BASF SE

Inventor： Torben Adermann ,  Daniel Loeffler ,  Carolin Limburg ,  Falko Abels ,  Hagen Wilmer ,  Monica Gill ,  Matthew Griffiths ,  Sean Barry

IPC: C23C16/18 ,  C07F15/06 ,  C23C16/455

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.

公开(公告)号：US10669297B2

公开(公告)日：2020-06-02

申请号：US15779893

申请日：2016-11-30

Applicant: BASF SE

Inventor： Torben Adermann ,  Daniel Loeffler ,  Hagen Wilmer ,  Kerstin Schierle-Arndt ,  Jan Gerkens ,  Christian Volkmann ,  Sven Schneider

IPC: C09D1/00 ,  C07F15/06 ,  C23C16/18 ,  C23C16/455 ,  C01B33/06 ,  C09D5/02 ,  H01L21/285 ,  H01L21/768

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, or 2, R1, R2 are an alkyl group, an alkenyl group, an aryl group or a silyl group, m is 1, 2, or 3, R3, R4, and R5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group, and p is 1, 2 or 3.

公开(公告)号：US12134803B2

公开(公告)日：2024-11-05

申请号：US17250339

申请日：2019-07-09

Applicant: BASF SE

Inventor： Wolfgang Rohde ,  Torben Adermann ,  Kerstin Schierle-Arndt ,  Birgit Gerke

IPC: H01M10/54 ,  C22B1/00 ,  C22B3/00 ,  C22B7/00 ,  C22B26/12

Abstract: Process for the recovery of transition metal from spent lithium ion batteries containing nickel, wherein said process comprises the steps of (a) heating a lithium containing transition metal oxide material to a temperature in the range of from 200 to 900° C. in the presence of H2, (b) treatment of the product obtained in step (a) with an aqueous medium, (c) solid-solid separation for the removal of Ni from the solid residue of step (b), (d) recovery of Li as hydroxide or salt from the solution obtained in step (b), (e) extraction of Ni and, if applicable, Co from the solid Ni-concentrate obtained in step (c).

公开(公告)号：US12152287B2

公开(公告)日：2024-11-26

申请号：US17046766

申请日：2019-04-01

Applicant: BASF SE

Inventor： Wolfgang Rohde ,  Torben Adermann ,  Thomas Michael Ryll ,  Kerstin Schierle-Arndt ,  Fabian Seeler ,  Sabine Weiguny ,  Michael Zeilinger

IPC: C22B26/12 ,  C22B1/00 ,  C22B3/44 ,  C22B7/00

Abstract: Process for the recovery of transition metal from spent lithium ion batteries containing nickel, wherein said process comprises the steps of (a) heating a lithium containing transition metal oxide material to a temperature in the range of from 400 to 1200° C., (b) treating said heat-treated material with water, (c) treating the solid residue from step (b) with an acid selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, oxalic acid and citric acid, (d) adjusting the pH value to 2.5 to 8, (e) removing compounds of Al, Cu, Fe, Zn or combinations of at least two of the foregoing from the solution or slurry obtained in step (d).

公开(公告)号：US11180852B2

公开(公告)日：2021-11-23

申请号：US16322999

申请日：2017-08-23

Applicant: BASF SE

Inventor： Torben Adermann ,  Falko Abels ,  Carolin Limburg ,  Hagen Wilmer ,  Jan Gerkens ,  Sven Schneider

IPC: C23C16/455 ,  C07F15/06 ,  C23C16/18

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p+q=3, and m is 1, 2, or 3.

公开(公告)号：US20210323824A1

公开(公告)日：2021-10-21

申请号：US17267604

申请日：2019-08-20

Applicant: BASF SE ,  University of Waterloo

Inventor： Linda Nazar ,  Torben Adermann ,  Joern Kulisch ,  Pascal Hartmann ,  Laidong Zhou

IPC: C01B25/455 ,  H01M10/0525 ,  H01M10/0562 ,  C01B25/26

Abstract: Described are a solid material which has ionic conductivity for lithium ions, a process for preparing said solid material, a use of said solid material as a solid electrolyte for an electrochemical cell, a solid structure selected from the group consisting of a cathode, an anode and a separator for an electrochemical cell, and an electrochemical cell comprising such solid structure.