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公开(公告)号:EP0252870A3
公开(公告)日:1988-09-28
申请号:EP87630120
申请日:1987-07-02
Applicant: BATTELLE MEMORIAL INSTITUTE
Inventor: Sliemers, Francis A. , Nandi, Uma S. , Behrer, Philip C. , Nance, George P.
CPC classification number: B05D1/62 , C03C17/30 , Y10T428/265 , Y10T428/31507 , Y10T428/31612 , Y10T428/31663 , Y10T428/31678
Abstract: Disclosed are improved abrasion-resistant plasma coatings adapted to be coated onto substrates including polymeric substrates, glass, and metal. The method for plasma coating the substrates comprises restricting the monomer to be a silane, disiloxane, silazane, or disilazane which is substituted with at least one alkoxy group per silicon atom wherein the alkoxy group is selected from methoxy groups, ethoxy groups, and mixtures thereof. The plasma coating is applied under plasma coating conditions for a time adequate to form an abrasion-resistant coating having sufficient thickness so as to possess a Taber abrasion resistance of less than 10% haze development after 100 cycles. Abrasion resistance of some disclosed coatings is less than about 5% development after 1,000 cycles.
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公开(公告)号:EP0252870B1
公开(公告)日:1991-06-12
申请号:EP87630120.1
申请日:1987-07-02
Applicant: BATTELLE MEMORIAL INSTITUTE
Inventor: Sliemers, Francis A. , Nandi, Uma S. , Behrer, Philip C. , Nance, George P.
CPC classification number: B05D1/62 , C03C17/30 , Y10T428/265 , Y10T428/31507 , Y10T428/31612 , Y10T428/31663 , Y10T428/31678
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公开(公告)号:EP0252870A2
公开(公告)日:1988-01-13
申请号:EP87630120.1
申请日:1987-07-02
Applicant: BATTELLE MEMORIAL INSTITUTE
Inventor: Sliemers, Francis A. , Nandi, Uma S. , Behrer, Philip C. , Nance, George P.
CPC classification number: B05D1/62 , C03C17/30 , Y10T428/265 , Y10T428/31507 , Y10T428/31612 , Y10T428/31663 , Y10T428/31678
Abstract: Disclosed are improved abrasion-resistant plasma coatings adapted to be coated onto substrates including polymeric substrates, glass, and metal. The method for plasma coating the substrates comprises restricting the monomer to be a silane, disiloxane, silazane, or disilazane which is substituted with at least one alkoxy group per silicon atom wherein the alkoxy group is selected from methoxy groups, ethoxy groups, and mixtures thereof. The plasma coating is applied under plasma coating conditions for a time adequate to form an abrasion-resistant coating having sufficient thickness so as to possess a Taber abrasion resistance of less than 10% haze development after 100 cycles. Abrasion resistance of some disclosed coatings is less than about 5% development after 1,000 cycles.
Abstract translation: 公开了适于涂覆在包括聚合物基底,玻璃和金属的基底上的耐磨等离子体涂层。 用于等离子体涂覆基材的方法包括将单体限制为硅烷,二硅氧烷,硅氮烷或二硅氮烷,其被硅原子取代为至少一个烷氧基,其中烷氧基选自甲氧基,乙氧基及其混合物 。 等离子体涂层在等离子体涂覆条件下施加足以形成具有足够厚度的耐磨涂层的时间,以便在100次循环后具有小于10%雾度显影的泰伯耐磨性。 一些公开的涂层的耐磨性在1,000次循环后小于约5%。
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