Patent search ap:("Basf Ag") AND inv:"MON YON YUN" Page 1

1.

发明专利
失效

公开(公告)号：JPS6032175B2

公开(公告)日：1985-07-26

申请号：JP5722678

申请日：1978-05-16

Applicant: BASF AG

Inventor： BERUNTO BURONSUTERUTO , UERUNERU KYUSUTERUSU , MON YON YUN , GYUNTERU WARUBIRITSUHI

IPC: G03C1/00 , C08F2/00 , C08F2/50 , G03F7/004 , G03F7/031

2.

发明专利
Recording material enabling photopolymerization and manufacture of relief plate by use thereof 失效

公开(公告)号：JPS57124346A

公开(公告)日：1982-08-03

申请号：JP19873981

申请日：1981-12-11

Applicant: Basf Ag

Inventor： AUGUSUTO REENAA , HAINTSU URURIHI BUERUTAA , DEIITAA NEEGERE , BUERUNAA RENTSU , MON YON YUN , HORUSUTO RAIMAN , ARUBUREHITO EKERU

IPC: C08G18/60 , C08G18/67 , G03F7/037

CPC classification number: G03F7/037 , C08G18/603 , C08G18/67 , C08G18/6705 , Y10S430/107 , C08G18/0814

3.

发明专利
Recording material enabling photopolymerization and manufacture of relief plate by use thereof 失效
Title translation: 记录材料使用光电聚焦和制造减震板

公开(公告)号：JPS57124345A

公开(公告)日：1982-08-03

申请号：JP19873881

申请日：1981-12-11

Applicant: Basf Ag

Inventor： AUGUSUTO REENAA , MON YON YUN , BUERUNAA RENTSU , PEETAA RIHITAA , AKUSERU ZANAA , GUNAARU SHIYORUNIKU , HAINTSU URURIHI BUERUTAA , ARUBUREHITO EKERU

IPC: G03F7/035 , C08G18/67 , G03F7/032

CPC classification number: G03F7/032 , C08G18/67 , C08G18/6705 , C08G18/0814

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