Method and apparatus for electromagnetic powder deposition
    1.
    发明申请
    Method and apparatus for electromagnetic powder deposition 审中-公开
    电磁粉末沉积的方法和装置

    公开(公告)号:US20020146508A1

    公开(公告)日:2002-10-10

    申请号:US10014778

    申请日:2001-12-11

    CPC classification number: C23C4/134

    Abstract: The present invention provides a method for depositing powder particles on a substrate. The method comprises forming a planar plasma armature, accelerating the plasma armature, accelerating a column of gas with the plasma armature; and accelerating the powder particles with the column of gas. The present invention provides for a railgun, comprising first and second conducting rails, and first and second insulating rails. The insulating and conducting rails form a bore of the railgun. The first and second conducting rails are separated by the insulating rails. At least one of the rails has a port in the wall thereof, the port is adapted to introducing powder particles into the bore.

    Abstract translation: 本发明提供了一种在基底上沉积粉末颗粒的方法。 该方法包括形成平面等离子体电枢,加速等离子体电枢,用等离子体电枢加速一列气体; 并用气柱加速粉末颗粒。 本发明提供一种轨道枪,其包括第一和第二导电轨道,以及第一和第二绝缘轨道。 绝缘导电轨道形成轨道枪孔。 第一和第二导电轨由绝缘导轨隔开。 至少一个导轨在其壁中具有一个端口,该端口适于将粉末颗粒引入孔中。

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