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公开(公告)号：DE60018894T2
公开(公告)日：2006-05-11
申请号：DE60018894
申请日：2000-11-06
Applicant: CANON KK
Inventor： KODERA YASUTO , KOBAYASHI FUMIKAZU , FURUSAWA TOSHINORI
Abstract: In a coating method for forming a film of a coating material on a substrate by supplying the coating material from a coating unit to the substrate held by a stage while the coating unit is moved relative to the stage, the stage includes a substrate-holding section and a peripheral section which has a surface higher than that of the substrate-holding section. The coating method includes the steps of mounting the substrate on the substrate-holding section of the stage; forming the film of the coating material so that the coating covers the substrate and extends to the peripheral section; and removing the coating material remaining in the peripheral section by a coating material removing unit after the substrate provided with the film is dismounted from the stage.
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公开(公告)号：DE60018894D1
公开(公告)日：2005-04-28
申请号：DE60018894
申请日：2000-11-06
Applicant: CANON KK
Inventor： KODERA YASUTO , KOBAYASHI FUMIKAZU , FURUSAWA TOSHINORI
Abstract: In a coating method for forming a film of a coating material on a substrate by supplying the coating material from a coating unit to the substrate held by a stage while the coating unit is moved relative to the stage, the stage includes a substrate-holding section and a peripheral section which has a surface higher than that of the substrate-holding section. The coating method includes the steps of mounting the substrate on the substrate-holding section of the stage; forming the film of the coating material so that the coating covers the substrate and extends to the peripheral section; and removing the coating material remaining in the peripheral section by a coating material removing unit after the substrate provided with the film is dismounted from the stage.
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公开(公告)号：JP2001269606A
公开(公告)日：2001-10-02
申请号：JP2000087729
申请日：2000-03-28
Applicant: CANON KK
Inventor： FURUSAWA TOSHINORI , KOBAYASHI FUMIKAZU , KODERA YASUHITO
IPC: G03F7/16 , B05C5/02 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a die coater for performing economical cleaning operation by a simple work. SOLUTION: A coating film layer 4 making >=55 deg. contact angle with a coating liquid and made of a metal or a resin is formed on a coating head inside part 3 of a coating head 1 and the surface of a spacer 2.
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公开(公告)号：JP2000047228A
公开(公告)日：2000-02-18
申请号：JP22954598
申请日：1998-07-31
Applicant: CANON KK
Inventor： FURUSAWA TOSHINORI
IPC: G02F1/1339 , G02F1/1337
Abstract: PROBLEM TO BE SOLVED: To provide a liquid crystal display element which obviates the peeling of bonded substrates and does not leave air bubbles within a panel. SOLUTION: This liquid crystal display element is constituted by filling the liquid crystals into the panel 10 formed by adhering a pair of the substrates 1, 2 disposed to each other apart a specified spacing by a sealing material 4. This sealing material 4 is arranged across a region 13 formed with an alignment layer 3 on at least one substrate and a region 23 where the alignment layer 3 is not formed.
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公开(公告)号：JP2001276709A
公开(公告)日：2001-10-09
申请号：JP2000096626
申请日：2000-03-31
Applicant: CANON KK
Inventor： KOBAYASHI FUMIKAZU , FURUSAWA TOSHINORI , KODERA YASUHITO
IPC: G03F7/16 , B05C5/02 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To form a coating film uniform in thickness by preventing the generation of a liquid sump or bead at a coating start position in a coating apparatus employing a die coating method. SOLUTION: Resin coating layers 3a, 3b of which the contact angles with a coating solution 4 are 50o$ or more are formed on the outer wall side surfaces of two blades 2a, 2b forming a slit and the contact angle with the coating solution 4 of the leading end of the slit is set to 300 deg. or less.
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Patent Agency Ranking
公开(公告)号：JP2003260398A
公开(公告)日：2003-09-16
申请号：JP2002063706
申请日：2002-03-08
Applicant: CANON KK
Inventor： FURUSAWA TOSHINORI , KODERA YASUHITO
IPC: G03F7/16 , B05C5/02 , B05C11/10 , B05D1/26 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To uniformize the thickness distribution of a coating film in the coating width direction in a die coat type coating apparatus. SOLUTION: The film thickness distribution in the coating width direction is uniformized by setting the length of a slit in the vicinity of both end parts of the coating width longer than the length of the slit in the inside of the end part to reduce the discharge quantity of a coating liquid in the vicinity of both ends than that in the inside. COPYRIGHT: (C)2003,JPO
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公开(公告)号：JP2002239445A
公开(公告)日：2002-08-27
申请号：JP2001038229
申请日：2001-02-15
Applicant: CANON KK
Inventor： KODERA YASUHITO , FURUSAWA TOSHINORI , KOBAYASHI FUMIKAZU
IPC: G03F7/16 , B05C5/02 , B05C11/10 , B05D1/40 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating method, by which the film thickness near the edge part of a coating film coated by a die coat coating method can be uniformized. SOLUTION: The coating apparatus for forming a liquid film on a substrate 107 by supplying a coating liquid 105 to a coating head 101 having a parallel slit part formed by at least two blades from an apparatus for supplying liquid, which is composed of a cylinder 102, a piston 103 and a servo-motor 104 for controlling a discharge quantity and the like, to discharge the coating liquid 105, and relatively moving the coating head 101 and a substrate stage 108 is provideded with a controller 110 and a control process of a control means for controlling the acceleration of the substrate stage 108 with the change of the liquid pressure of the inside of the coating head 101 in the coating starting part, the coating finishing part and the range in the vicinity thereof.
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公开(公告)号：JP2002059060A
公开(公告)日：2002-02-26
申请号：JP2000250980
申请日：2000-08-22
Applicant: CANON KK
Inventor： KODERA YASUHITO , KOBAYASHI FUMIKAZU , FURUSAWA TOSHINORI
IPC: G03F7/16 , B05C5/02 , B05C13/02 , B05D1/26 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To solve the problem that, in a conventional application method, uniformity in the surface of a formed liquid film is not enough, especially the difference between the liquid film thickness at the end part of a substrate and the film thickness at the middle part of the substrate is apt to occur to cause the nonuniformity of the film thickness, and the inclusion of bubbles and the breakage of the film are generated dependently on the thickness of the substrate and the material of the film. SOLUTION: In an application method in which, while an application means 2 is moved relatively to a substrate stage 1 for holding the substrate W, and a coating liquid P is supplied from the application means 2 to the substrate W held on the substrate stage 1 to form a coating film on the substrate, the substrate is mounted on the substrate holding part 5 of the substrate stage 1 having the substrate holding part 5 and peripheral parts 1A-1C which can move vertically in relation to the substrate holding part 5, the position of the substrate holding part 5 in relation to the peripheral parts 1A-1C is decided by a change means 5A for changing the height of the substrate, and the liquid film is formed so that an application range covers the peripheral parts.
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公开(公告)号：JP2001269610A
公开(公告)日：2001-10-02
申请号：JP2000362097
申请日：2000-11-29
Applicant: CANON KK
Inventor： KODERA YASUHITO , KOBAYASHI FUMIKAZU , FURUSAWA TOSHINORI
Abstract: PROBLEM TO BE SOLVED: To provide a coating method of a coating film, which is capable of uniformly applying a liquid film repeatedly, and a coating device. SOLUTION: A substrate W is placed on a substrate holding part 5 in a substrate stage 1 having the substrate holding part 5 for holding the substrate and peripheral surfaces 1A, 1b and 1C each having a higher than the substrate holding part 5 and the liquid film is formed on the substrate W by relatively moving a coating head 8 of a coating means 2 to the substrate stage 1 to allow the coating range to be coated with the coating liquid P to reach the peripheral surfaces 1A and 1B of the substrate stage 1. The coating liquid P remaining on the peripheral surfaces 1A, 1B and 1C of the substrate stage 1 is removed by relatively moving a liquid absorbing roller 10 of the coating removing means 3 to the substrate stage 1 after the substrate, on which the liquid film is formed, is removed from the substrate stage 1. As a result, the uniformed liquid film is repeatedly formed on the substrate and the uniformity of the liquid film thickness is improved.
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公开(公告)号：JP2000147532A
公开(公告)日：2000-05-26
申请号：JP31730398
申请日：1998-11-09
Applicant: CANON KK
Inventor： OKADA SHINJIRO , WATABE YASUYUKI , FURUSAWA TOSHINORI , NAKAMURA KATSUTOSHI , SUNAGA MAKI , SAITO TETSUO
IPC: G02F1/137 , G02F1/1341 , G02F1/141
Abstract: PROBLEM TO BE SOLVED: To obtain a liquid crystal display element with excellent uniformity of cell thickness, with little change in cell thickness due to any added external force and with no vacuum foaming. SOLUTION: A liquid crystal display element comprises two electrode substrates 12, 14, placed opposite to each other, holding a smectic liquid crystal in between. In this case the liquid crystal display element has a smectic layer structure in a display region 15 which is open either at the side of injection port 36 or at the side of flow out port 31 and the layer structure is not interrupted with sealing members 11, 16 at one side and is interrupted with the sealing members 11, 16 at the other side.
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