公开(公告)号：JP2003264137A

公开(公告)日：2003-09-19

申请号：JP2002063710

申请日：2002-03-08

Applicant: CANON KK

Inventor： IIYAMA TOMONORI ,  NAKAMURA KATSUTOSHI

IPC: G03F7/38 ,  B05D3/12 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for film formation which takes out a film in the state of keeping the film of satisfactory film thickness distribution obtained by vacuum heating after drying in the method for forming a film by applying liquid having a compound dissolved in a solvent onto a substrate and drying the solvent by a vacuum and heating. SOLUTION: By the time of atmospheric release after vacuum drying, a film temperature is lowered and mucosity is raised to prevent film deformation caused by an air pressure variation. The film is cooled in a vacuum for this. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2003145029A

公开(公告)日：2003-05-20

申请号：JP2001348140

申请日：2001-11-14

Applicant: CANON KK

Inventor： NAKAMURA KATSUTOSHI ,  IIYAMA TOMONORI

IPC: G03F7/16 ,  B05D3/02 ,  B05D3/12 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method of forming a film having uniform film thickness even when the thick film is formed by applying a coating liquid on a substrate to form the coating film and removing a solvent in the coating film efficiently in a short time. SOLUTION: The solvent is removed by heating the substrate while keeping the certain degree of vacuum in a vacuum chamber by continuing the replacement with a gas containing no solvent in the vacuum chamber.