Abstract:
A method for manufacturing a discrete dynode electron multiplier includes employing micromachining and thin film techniques to produce tapered apertures in an etchable substrate, bonding the substrates together and activating the internal surfaces of the etched substrate using chemical vapor deposition or oxidizing and nitriding techniques.
Abstract:
A method for manufacturing a discrete dynode electron multiplier includes employing micromachining and thin film techniques to produce tapered apertures in an etchable substrate, bonding the substrates together and activating the internal surfaces of the etched substrate using chemical vapor deposition or oxidizing and nitriding techniques.