公开(公告)号：AU3554702A

公开(公告)日：2002-03-04

申请号：AU3554702

申请日：2001-06-26

Applicant: CORNING INC

Inventor： DAWES STEVEN B ,  BOOS NIKOLAUS ,  VALLON SOPHIE

IPC: G02B6/10 ,  G02B6/34 ,  G02B6/12

Abstract: A passive temperature-compensated integrated optical component having an array of adjacent waveguides, and a slab waveguide located within a groove at an intermediate section of the array. The waveguides have an index of refraction that increases with increasing temperature, and the slab waveguide has an index of refraction that decreases with increasing temperature. The slab waveguide compensates for a temperature-induced change in the refractive index of the waveguides to maintain a generally constant optical path difference between the adjacent waveguides over a temperature range.

公开(公告)号：AU6825401A

公开(公告)日：2002-02-25

申请号：AU6825401

申请日：2001-06-06

Applicant: CORNING INC

Inventor： BOEK HEATHER D ,  BOOS NIKOLAUS

IPC: C03B19/14 ,  C03C17/02 ,  C03C17/34 ,  C03C17/42 ,  C03B19/06 ,  C03B37/018

公开(公告)号：AU7151101A

公开(公告)日：2002-03-22

申请号：AU7151101

申请日：2001-06-26

Applicant: CORNING INC

Inventor： ALIBERT JEAN-MARIE G ,  BOOS NIKOLAUS ,  SALIK MARK D

IPC: G02B6/12 ,  G02B6/124 ,  G02B6/136 ,  G02B6/34 ,  B44C1/22

Abstract: A method of fabricating a grating in a planar optical device by fabricating a surface grating or by photoinscription. For surface gratings, a method comprises providing a substrate material that includes a substrate layer (104), a first core layer (108), a second core layer (112), and a first photoresist layer (114). An exposure of a grating and a plurality of alignment marks (147) is formed onto the substrate material. The second core layer is etched to form the grating in the second core layer. A second photoresist layer is deposited on the substrate material that remains after the first etching. An exposure of a waveguide pattern is formed in the first core layer. The first core layer is etched to define a first waveguide in the first core layer, where the first waveguide includes a first portion having the surface grating. For photoinscription, the fabrication method comprises providing a substrate material that includes a substrate layer (204), a core layer (208), and a first photoresist layer. A first photo-mask that includes a plurality of alignment marks is disposed between the first photoresist and a light source. An exposure of the first photo-mask (220) is performed and the alignment marks are etched into the core layer. A grating is written into the core layer by a photosensitive effect. A second photoresist layer is deposited on the substrate material and an exposure of a waveguide pattern is formed in the core layer. The core layer is etched to define a first waveguide in the core layer, where the first waveguide includes a first portion having the surface grating.