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    4.
    发明专利
    未知

    公开(公告)号：ES2095343T3

    公开(公告)日：1997-02-16

    申请号：ES92104459

    申请日：1992-03-16

    Applicant: CORNING INC

    Inventor： BLACKWELL JEFFERY LYNN ,  DOBBINS MICHAEL SEAN ,  MCLAY ROBERT ERNEST ,  TRUESDALE CARLTON MAURICE

    IPC: C03B37/018 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03C3/06 ,  C07F7/08 ,  C07F7/10 ,  G02B6/00

    Abstract: This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: (1) a Si-R bond dissociation energy that is no higher than the dissociation energy of the Si-O bond; (2) a boiling point no higher than 350 DEG C; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.

    5.
    发明专利
    未知

    公开(公告)号：DE69215791D1

    公开(公告)日：1997-01-23

    申请号：DE69215791

    申请日：1992-03-16

    Applicant: CORNING INC

    Inventor： BLACKWELL JEFFERY LYNN ,  DOBBINS MICHAEL SEAN ,  MCLAY ROBERT ERNEST ,  TRUESDALE CARLTON MAURICE

    IPC: C03B37/018 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03C3/06 ,  C07F7/08 ,  C07F7/10 ,  G02B6/00

    Abstract: This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: (1) a Si-R bond dissociation energy that is no higher than the dissociation energy of the Si-O bond; (2) a boiling point no higher than 350 DEG C; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.

    Method of making fused silica
    6.
    发明专利
    Method of making fused silica 未知

    公开(公告)号：AU655832B2

    公开(公告)日：1995-01-12

    申请号：AU2126092

    申请日：1992-08-24

    Applicant: CORNING INC

    Inventor： TRUESDALE CARLTON MAURICE ,  BLACKWELL JEFFERY LYNN ,  DOBBINS MICHAEL SEAN ,  MCLAY ROBERT ERNEST

    IPC: C03B37/018 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03C3/06 ,  C07F7/08 ,  C07F7/10 ,  G02B6/00

    Abstract: This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: (1) a Si-R bond dissociation energy that is no higher than the dissociation energy of the Si-O bond; (2) a boiling point no higher than 350 DEG C; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.

    7.
    发明专利
    未知

    公开(公告)号：DE69215791T2

    公开(公告)日：1997-04-03

    申请号：DE69215791

    申请日：1992-03-16

    Applicant: CORNING INC

    Inventor： BLACKWELL JEFFERY LYNN ,  DOBBINS MICHAEL SEAN ,  MCLAY ROBERT ERNEST ,  TRUESDALE CARLTON MAURICE

    IPC: C03B37/018 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03C3/06 ,  C07F7/08 ,  C07F7/10 ,  G02B6/00

    Abstract: This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: (1) a Si-R bond dissociation energy that is no higher than the dissociation energy of the Si-O bond; (2) a boiling point no higher than 350 DEG C; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.

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