METHOD AND EQUIPMENT FOR MEASURING REFRACTIVE INDEX OF WAFERCOMPRISING GLASS SUBSTANCE

    公开(公告)号:JPH08285725A

    公开(公告)日:1996-11-01

    申请号:JP10873296

    申请日:1996-04-05

    Inventor: RUIJI TAROONE

    Abstract: PROBLEM TO BE SOLVED: To provide a method and device for measuring a refractive index by utilizing multiple reflection in a sample. SOLUTION: Light beams are sent to a wafer 4 at different incidence angles and the transmittance of the wafer changes as the incidence angle changes due to the interference caused by the multiple reflection of beams in the wafer 4. An angle position where the transmittance is maximized and minimized is obtained for the maximum or minimum value corresponding to a normal incidence. The refractive index is obtained from the angle positions and the number of maximum and minimum values at different angles. Also, a device for implementing this method is given.

Patent Agency Ranking